US PATENT SUBCLASS 422 / 205
.~.~.~ Including baffle or stirring means disposed within jacket or chamber, the baffle means within chamber connected directly to wall thereof


Current as of: June, 1999
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422 /   HD   CHEMICAL APPARATUS AND PROCESS DISINFECTING, DEODORIZING, PRESERVING, OR STERILIZING

129  DF  CHEMICAL REACTOR {28}
198  DF  .~ Including heat exchanger for reaction chamber or reactants located therein {6}
202  DF  .~.~ Heat-exchange jacket surrounding reaction chamber {3}
205.~.~.~ Including baffle or stirring means disposed within jacket or chamber, the baffle means within chamber connected directly to wall thereof


DEFINITION

Classification: 422/205

Including baffle or stirring means disposed within jacket or chamber, the baffle means within chamber connected directly to wall thereof:

(under subclass 202) Apparatus comprising baffle or stirring means located within the heat-exchange jacket or the reaction chamber wherein the baffle means located within the chamber are attached directly to the wall of the chamber.