US PATENT SUBCLASS 422 / 176
.~.~ Including waste gas flow distributor upstream of reaction site and within reaction chamber modifying velocity profile of gas

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


422 /   HD   CHEMICAL APPARATUS AND PROCESS DISINFECTING, DEODORIZING, PRESERVING, OR STERILIZING

129  DF  CHEMICAL REACTOR {28}
168  DF  .~ Waste gas purifier {5}
176.~.~ Including waste gas flow distributor upstream of reaction site and within reaction chamber modifying velocity profile of gas

DEFINITION

Classification: 422/176

Including waste gas flow distributor upstream of reaction site and within reaction chamber modifying velocity profile of gas:

(under subclass 168) Apparatus having waste gas flow distribution means upstream of the purification reaction site and located within the reaction chamber for the purpose of equalizing or otherwise modifying the velocity profile of the waste gas at the upstream end of the reaction site.

SEE OR SEARCH THIS CLASS, SUBCLASS:

183, for claimed mixing means combined with means injecting combustion fuel in the reaction chamber. The mixing means may inherently act as a distribution device.