US PATENT SUBCLASS 399 / 206
.~.~ Slit exposure

Current as of: June, 1999
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399 /   HD   ELECTROPHOTOGRAPHY

130  DF  IMAGE FORMATION {30}
177  DF  .~ Exposure {15}
206.~.~ Slit exposure {8}
207  DF  .~.~.~> Diaphragm, shutter, shading board
208  DF  .~.~.~> Speed or acceleration control
209  DF  .~.~.~> Variable scanning (e.g., length)
210  DF  .~.~.~> Damping or braking
211  DF  .~.~.~> Scanning carriage parallel to original {1}
213  DF  .~.~.~> Movable platen {1}
215  DF  .~.~.~> By conveying original
216  DF  .~.~.~> By pivoting mirror

DEFINITION

Classification: 399/206

Slit exposure:

(under subclass 177) Subject matter wherein a portion of an original image is projected onto a photoconductive member continuously from one end of an original to the other until the entire original is exposed.

(1) Note. This subject matter may include, for example, either producing plural latent images from one exposure by splitting the light from the original into two or more portions or producing latent images on back and forth scanning.

OTHER CLASSIFICATION SYSTEMS:

ipc{2}G03G15/04, for exposing (i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material). G03G15/28, in which projection is obtained by line scanning. G03G15/30, in which projection is formed on a drum.

jpofiG03G15/04 113, for slit exposure (e.g., movement of the drum and movement of the original image). G03G15/28, in which projection is obtained by line scanning. G03G15/30, in which projection is formed on a drum.

epcG03G15/28, in which projection is obtained by line scanning. G03G15/30, in which projection is formed on a

drum.