US PATENT SUBCLASS 378 / 34
.~ Lithography
Current as of:
June, 1999
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378 /
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X-RAY OR GAMMA RAY SYSTEMS OR DEVICES
1
DF
SPECIFIC APPLICATION
{14}
34
.~ Lithography {1}
35
DF
.~.~
> Pattern mask
DEFINITION
Classification: 378/34
Lithography:
(under subclass 1) Subject matter including the projection of an X-ray image upon an X-ray sensitive resist usually through a patterned mask.