US PATENT SUBCLASS 378 / 34
.~ Lithography


Current as of: June, 1999
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378 /   HD   X-RAY OR GAMMA RAY SYSTEMS OR DEVICES

1  DF  SPECIFIC APPLICATION {14}
34.~ Lithography {1}
35  DF  .~.~> Pattern mask


DEFINITION

Classification: 378/34

Lithography:

(under subclass 1) Subject matter including the projection of an X-ray image upon an X-ray sensitive resist usually through a patterned mask.