US PATENT SUBCLASS 250 / 550
.~ Interference pattern analysis (e.g., spatial filtering or holography)

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


250 /   HD   RADIANT ENERGY

200  DF  PHOTOCELLS; CIRCUITS AND APPARATUS {11}
550.~ Interference pattern analysis (e.g., spatial filtering or holography)

DEFINITION

Classification: 250/550

(under subclass 200) Subject matter wherein the photocell

detects an interference pattern and produces an electrical output.

(1) Note. The interference pattern may be produced as a result of moire interference between similar patterns, a diffraction pattern of a grating, wire or hole or produced by holograms.

SEE OR SEARCH CLASS

356, Optics: Measuring and Testing,

395, for the superimposition of grids to measure or compare dimensions or configurations.