US PATENT SUBCLASS 219 / 121.4
.~.~.~.~ Etching

Current as of: June, 1999
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219 /   HD   ELECTRIC HEATING

50  DF  METAL HEATING (E.G., RESISTANCE HEATING) {19}
121.11  DF  .~ By arc {16}
121.36  DF  .~.~ Using plasma {8}
121.39  DF  .~.~.~ Cutting {2}
121.4.~.~.~.~ Etching {3}
121.41  DF  .~.~.~.~.~> Methods
121.42  DF  .~.~.~.~.~> Rate control
121.43  DF  .~.~.~.~.~> With chamber

DEFINITION

Classification: 219/121.4

Etching:

(under subclass 121.39) Subject matter wherein eroding or abrading is accomplished with a plasma torch.

SEE OR SEARCH CLASS

156, Adhesive Bonding and Miscellaneous Chemical Manufacture,

345, for differential etching apparatus.

204, Chemistry: Electrical and Wave Energy,

192.32+, for a sputter etching process and subclasses 298.31+ for the corresponding apparatus.

216, Etching a Substrate: Processes, 67+, for chemically etching a substrate with a plasma.

313, Electric Lamp and Discharge Devices,

231.31+, fluid supply with plasma devices.

315, Electric Lamp and Discharge Devices: Systems,

111.21+, for plasma generating systems.