US PATENT SUBCLASS 205 / 667
.~.~ Of photoresist or radiation resist

Current as of: June, 1999
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205 /   HD   ELECTROLYSIS: PROCESSES, COMPOSITIONS USED THEREIN, AND METHODS OF PREPARING THE COMPOSITIONS

640  DF  ELECTROLYTIC EROSION OF A WORKPIECE FOR SHAPE OR SURFACE CHANGE (E.G., ETCHING, POLISHING, ETC.) (PROCESS AND ELECTROLYTE COMPOSITION) {19}
666  DF  .~ Using mask {1}
667.~.~ Of photoresist or radiation resist

DEFINITION

Classification: 205/667

Of photoresist or radiation resist:

(under subclass 666) Process in which the mask is composed of a material which exhibits physical changes when exposed to light or radiation and is more resistant to electrolytic erosion than is the workpiece.

SEE OR SEARCH CLASS

430, Radiation Imagery Chemistry: Process, Composition, or Product Thereof, appropriate subclasses for creating a coating imagewise through a radiation imagery process. However, Class 205,

640+, accepts the combination of electrolytic erosion with a Class 430 imaging step.