US PATENT SUBCLASS 205 / 542
.~.~.~.~.~.~ Titanium, zirconium, hafnium, vanadium, niobium, or tantalum containing (Ti, Zr, Hf, V, Nb, or Ta)


Current as of: June, 1999
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205 /   HD   ELECTROLYSIS: PROCESSES, COMPOSITIONS USED THEREIN, AND METHODS OF PREPARING THE COMPOSITIONS

334  DF  ELECTROLYTIC SYNTHESIS (PROCESS, COMPOSITION, AND METHOD OF PREPARING COMPOSITION) {21}
464  DF  .~ Preparing inorganic compound {9}
477  DF  .~.~ Metal containing compound produced {11}
538  DF  .~.~.~ Oxide {4}
539  DF  .~.~.~.~ Manganese containing {2}
541  DF  .~.~.~.~.~ Utilizing specified electrode {1}
542.~.~.~.~.~.~ Titanium, zirconium, hafnium, vanadium, niobium, or tantalum containing (Ti, Zr, Hf, V, Nb, or Ta)


DEFINITION

Classification: 205/542

Titanium, zirconium, hafnium, vanadium, niobium, or tantalum containing (Ti, Zr, Hf, V, Nb, or Ta):

(under subclass 541) Subject matter wherein the electrode contains titanium, zirconium, hafnium, vanadium, niobium, or tantalum.