US PATENT SUBCLASS 205 / 535
.~.~.~.~.~.~.~.~ Valve metal containing electrode substrate (i.e., Ta, Nb, Hf, Zr, Ti, V, W, Be, or Al)

Current as of: June, 1999
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205 /   HD   ELECTROLYSIS: PROCESSES, COMPOSITIONS USED THEREIN, AND METHODS OF PREPARING THE COMPOSITIONS

334  DF  ELECTROLYTIC SYNTHESIS (PROCESS, COMPOSITION, AND METHOD OF PREPARING COMPOSITION) {21}
464  DF  .~ Preparing inorganic compound {9}
477  DF  .~.~ Metal containing compound produced {11}
508  DF  .~.~.~ Hydroxide {2}
510  DF  .~.~.~.~ Alkali metal containing {3}
516  DF  .~.~.~.~.~ And elemental halogen produced {4}
526  DF  .~.~.~.~.~.~ Utilizing specified electrode (e.g., rod, cylinder, etc.) {4}
532  DF  .~.~.~.~.~.~.~ Laminated or coated {3}
535.~.~.~.~.~.~.~.~ Valve metal containing electrode substrate (i.e., Ta, Nb, Hf, Zr, Ti, V, W, Be, or Al)

DEFINITION

Classification: 205/535

Valve metal containing electrode substrate (i.e., Ta, Nb, Hf, Zr, Ti, V, W, Be, or Al):

(under subclass 532) Subject matter wherein the electrode substrate contains a valve metal.

(1) Note. For purposes of this subclass, a valve metal is a metal which forms an electrically insulating, corrosion-resistant oxide film upon exposure to acidic materials under anodic conditions. The valve metals are also referred to as the film-forming metals.

SEE OR SEARCH CLASS

204, Chemistry: Electrical and Wave Energy,

290+, for electrodes having a valve metal substrate.