US PATENT SUBCLASS 205 / 316
.~ Forming nonmetal coating

Current as of: June, 1999
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205 /   HD   ELECTROLYSIS: PROCESSES, COMPOSITIONS USED THEREIN, AND METHODS OF PREPARING THE COMPOSITIONS

80  DF  ELECTROLYTIC COATING (PROCESS, COMPOSITION AND METHOD OF PREPARING COMPOSITION) {42}
316.~ Forming nonmetal coating {8}
317  DF  .~.~> Coating is predominantly organic material
318  DF  .~.~> Phosphorus-containing coating (e.g., phosphate, etc.)
319  DF  .~.~> Chromium-containing coating (e.g., chromate, etc.)
320  DF  .~.~> Predominantly iron or steel substrate
321  DF  .~.~> Predominantly magnesium substrate
322  DF  .~.~> Predominantly titanium, vanadium, zirconium, niobium, hafnium, or tantalum substrate
323  DF  .~.~> Predominantly aluminum substrate {1}
333  DF  .~.~> Oxide-containing coating (e.g., lead dioxide, etc.)

DEFINITION

Classification: 205/316

Forming nonmetal coating:

(under subclass 80) Subject matter for the electrolytic production of coatings which contain nonmetal material which has been electrolytically produced (e.g., anodic oxide, etc.).

(1) Note. Certain nonmetallics may variously be semiconductive. Examples of such include (but are not limited to) selenium, tellurium, silicon carbide, diamond, copper oxide, etc. However, without positive recitation that a nonmetallic material is semiconductive, placement is proper hereunder.

SEE OR SEARCH THIS CLASS, SUBCLASS:

123, for electrolytic coating a selected area on a semiconductor substrate.

157, for electrolytic coating of a semiconductor substrate.

SEE OR SEARCH CLASS

438, Semiconductor Device Manufacturing: Process, for (a) combined processes and (b) certain unit operations of manufacturing a semiconductive substrate or device.