US PATENT SUBCLASS 205 / 157-- .~ Coating predominantly semiconductor substrate (e.g., silicon, compound semiconductor, etc.)

US PATENT SUBCLASS 205 / 157
.~ Coating predominantly semiconductor substrate (e.g., silicon, compound semiconductor, etc.)

Current as of: June, 1999
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205 /	HD	ELECTROLYSIS: PROCESSES, COMPOSITIONS USED THEREIN, AND METHODS OF PREPARING THE COMPOSITIONS

80	DF	ELECTROLYTIC COATING (PROCESS, COMPOSITION AND METHOD OF PREPARING COMPOSITION) {42}
157		.~ Coating predominantly semiconductor substrate (e.g., silicon, compound semiconductor, etc.)

DEFINITION

Classification: 205/157

Coating predominantly semiconductor substrate (e.g., silicon, compound semiconductor, etc.):

(under subclass 80) Subject matter wherein the major or predominant constituent of the substrate is a semiconductor.

(1) Note. See subclass 123, (1) Note, for the definition of a semiconductor.

(2) Note. This subclass includes processes of electrolytic coating, per se, on a semiconductor material and combinations of electrolytic coating with an additional step or steps which are preparatory treatments that adapt the material for electrolytic coating or which perfect the electrolytic coating.

SEE OR SEARCH CLASS

438, Semiconductor Device Manufacturing: Processes, for (a) combined processes and (b) certain unit operations of manufacturing a semiconductive substrate or device.