US PATENT SUBCLASS 164 / 155.4
.~.~ Responsive to position or spatial dimension

Current as of: June, 1999
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164 /   HD   METAL FOUNDING

154.1  DF  CONTROL MEANS RESPONSIVE TO OR ACTUATED BY MEANS SENSING OR MEASURING A CONDITION OR VARIABLE (I.E., AUTOMATIC CONTROL) {6}
155.1  DF  .~ Control of feed material enroute to shaping area {5}
155.4.~.~ Responsive to position or spatial dimension {1}
155.5  DF  .~.~.~> Responsive to rate of change

DEFINITION

Classification: 164/155.4

Responsive to position or spatial dimension:

(under subclass 155.1) Apparatus wherein the process parameter monitored is (a) the location of a component or product therein, (b) the relative placement between any two components or between a component and a product therein, or (c) the lineal extent of a component or product therein.