US PATENT SUBCLASS 156 / 272.8
.~.~.~ Exposure of work to laser

Current as of: June, 1999
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156 /   HD   ADHESIVE BONDING AND MISCELLANEOUS CHEMICAL MANUFACTURE

1  DF  METHODS {7}
60  DF  .~ Surface bonding and/or assembly therefor {93}
272.2  DF  .~.~ With direct application of electrical, magnetic, or radiant energy to work {11}
272.8.~.~.~ Exposure of work to laser

DEFINITION

Classification: 156/272.8

Exposure of work to laser:

(under subclass 272.2) Processes wherein said energy is applied in the form of natural oscillations of atoms or molecules between energy levels for generating coherent electromagnetic radiation in the ultraviolet, visible, or infrared regions of the spectrum.