US PATENT SUBCLASS 117 / 7
.~ Using heat (e.g., strain annealing)

Current as of: June, 1999
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117 /   HD   SINGLE-CRYSTAL, ORIENTED-CRYSTAL, AND EPITAXY GROWTH PROCESSES; NON-COATING APPARATUS THEREFOR

4  DF  PROCESSES OF GROWTH FROM SOLID OR GEL STATE (E.G., SOLID PHASE RECRYSTALLIZATION) {3}
7.~ Using heat (e.g., strain annealing) {3}
8  DF  .~.~> Of amorphous precursor
9  DF  .~.~> Epitaxy formation
10  DF  .~.~> Using temperature gradient (e.g., moving zone recrystallization)

DEFINITION

Classification: 117/7

Using heat (e.g., strain annealing):

(under subclass 4) Subject matter in which the process includes use of heat to initiate and/or maintain crystal growth.

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3, for processes growing a single-crystal* which include a subsequent step of heat treating the product.

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264, Plastic and Nonmetallic Article Shaping or Treating: Processes,

345+, for, per se, processes of heat treating a non-semiconductor, non-metal*, preformed, shaped, or solid article, which may be a single-crystal*.